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Effect of Substrate Temperature on Thermal Properties and Deposition Kinetics of Atmospheric Plasma Deposited Methyl(methacrylate) Films

Scheltjens G., Van Assche G. and Van Mele B.Effect of Substrate Temperature on Thermal Properties and Deposition Kinetics of Atmospheric Plasma Deposited Methyl(methacrylate) Films, PLASMA PROCESSES AND POLYMERS,14(3),2017 (MAR).

doi: 10.1002/ppap.201500213

isi: 1500213

The first part of this paper focuses on the chemical and thermal properties of pdMMA films, which are evaluated as a function of T-substrate. Thermogravimetric analysis reveals a decreased low molecular weight fraction and enhanced cross-link density with increasing T-substrate. In accordance, an enhanced glass transition is observed with differential scanning calorimetry. In a second part, a new Arrhenius-type empirical model is presented for the specific plasma deposition rate k(0), i.e., k0(Yf,T)=Aapp(Yf)exp(-Eapp/(RT)), with input plasma power and precursor feed rate (by means of the Yasuda factor, Y-f) and T of the substrate as variables of the plasma deposition process. A simplified plasma deposition mechanism is suggested based on adsorption, desorption, and surface plasma polymerization of activated species, justifying the experimental findings and empirical model.

BibTeX

@article{,
    author  = "Scheltjens,G.; Van Assche,G.; Van Mele,B.",
    title   = "Effect of Substrate Temperature on Thermal Properties and Deposition Kinetics of Atmospheric Plasma Deposited Methyl(methacrylate) Films",
    journal = " PLASMA PROCESSES AND POLYMERS",
    year    = "2017",
    volume  = "14",
    number  = "3",
    pages   = "",
    month   = "MAR",
    doi     = "10.1002/ppap.201500213",
    note    = "",
}